Table 1 Data on the 36 samples used in the RNAseq study

Ls A-2013

4

Laboratory strain, sensitive to all delousing chemicals. Collected in northern Norway in 2011. Sixth generation. Not exposed to delousing chemicals during cultivation of any generation

Ls V-2013

5

Field strain, resistant to azamethiphos, deltamethrin, emamectin benzoate and hydrogen peroxide. Collected in mid-Norway in 2013

Ls A-P0

3

Laboratory strain. 12th generation of Ls A (sensitive). Not exposed to delousing chemicals during cultivation of any generation

Ls V-P0

4

Laboratory strain. Sixth generation of Ls V (resistant). Not exposed to delousing chemicals during cultivation of any generation

Ls F2-S

8

Second generation after crossing of Ls A-P0 and Ls V-P0, affected by 600 ppm H₂O₂ for 30 min (sensitive). Three lice from family group 1 and five lice from family group 2

Ls F2-R

12

Second generation after crossing of Ls A-P0 and Ls V-P0, unaffected by 1800 ppm H₂O₂ for 30 min (resistant). Seven lice from family group 1 and five lice from family group 2